Interface Properties of Atomic Layer Deposited TiO2/Al2O3 Films on In0.53Ga0.47As/InP Substrates

Title
Interface Properties of Atomic Layer Deposited TiO2/Al2O3 Films on In0.53Ga0.47As/InP Substrates
Authors
Keywords
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Journal
ACS Applied Materials & Interfaces
Volume 6, Issue 5, Pages 3263-3274
Publisher
American Chemical Society (ACS)
Online
2014-01-29
DOI
10.1021/am405019d

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