Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 6, Issue 23, Pages 20837-20841Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am505221g
Keywords
colloidal monolayer; reusable; soft photomask; wafer scale; nanopatterning
Funding
- Early Career Scheme of the Research Grants Council of Hong Kong SAR, China [CityU 139413]
- National Natural Science Foundation of China [51202205]
- Guangdong National Science Foundation [S2012010010725]
- Science Technology and Innovation Committee of Shenzhen Municipality [JCYJ20120618140624228]
- Shenzhen Research Institute, City University of Hong Kong
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We demonstrate the repeated utilization of self-assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Because of the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problems, enabling reliable production of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.
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