Adsorption Behaviors of DNA/Cation Complexes on Amino and Silica Chip Surfaces: A Dual Polarization Interferometry Study

The adsorption of DNA/Ca2+, DNA/Cu2+, and DNA/Co(NH3)(6)(3+) complexes on amino and silica chip surfaces were investigated using dual polarization interferometry. A more compact DNA/cation complex layer formed on the amino chip surface compared with that on the silica chip surface at the same cation condition. The real-time mass, thickness, and density changes were monitored during the adsorption process. The overall results show that the approaching complexes can cause the conformation rearrangement of the preadsorbed complexes and the preadsorbed complexes affect the deposition Pattern of the approaching complexes during the adsorption of DNA/Ca2+ and DNA/Cu2+ complexes on both chip surfaces. The relatively strong electrostatic repulsion between the approaching and adsorbed complexes results in multiple mass loading rate changes and loose attachment of the approaching complexes. The weak repulsion between the DNA/Co (NH3)(6)(3+) complexes cannot induce this kind of conformation rearrangement. Thus, no multiple mass loading rate changes were observed. Meanwhile, the preadsorbed DNA/Co(NH3)(6)(3+) complex can also affect the deposition pattern of the approaching complex because of the geometric resistance. Therefore, this study will help better understand the conformation change and deposition pattern of complexes with different charge conditions during the adsorption process on the solid-liquid interface.