“Double Exposure Method”: a Novel Photolithographic Process to Fabricate Flexible Organic Field-Effect Transistors and Circuits

Published 2012 View Full Article

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Title
“Double Exposure Method”: a Novel Photolithographic Process to Fabricate Flexible Organic Field-Effect Transistors and Circuits
Authors
Keywords
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Journal
ACS Applied Materials & Interfaces
Volume 5, Issue 7, Pages 2316-2319
Publisher
American Chemical Society (ACS)
Online
2012-12-28
DOI
10.1021/am302684k

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