Atomic Layer Deposition on Phase-Shift Lithography Generated Photoresist Patterns for 1D Nanochannel Fabrication

Published 2010 View Full Article

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Title
Atomic Layer Deposition on Phase-Shift Lithography Generated Photoresist Patterns for 1D Nanochannel Fabrication
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume 2, Issue 12, Pages 3473-3478
Publisher
American Chemical Society (ACS)
Online
2010-11-04
DOI
10.1021/am100592f

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