Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma

Published 2015 View Full Article

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Title
Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume 7, Issue 20, Pages 10806-10813
Publisher
American Chemical Society (ACS)
Online
2015-05-01
DOI
10.1021/acsami.5b01531

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