CuAlO 2 and CuAl 2 O 4 thin films obtained by stacking Cu and Al films using physical vapor deposition

Published 2018 View Full Article

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Title
CuAlO 2 and CuAl 2 O 4 thin films obtained by stacking Cu and Al films using physical vapor deposition
Authors
Keywords
PVD, Copper aluminates, Thin films
Journal
Results in Physics
Volume 9, Issue -, Pages 745-752
Publisher
Elsevier BV
Online
2018-03-26
DOI
10.1016/j.rinp.2018.03.046

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