Journal
MATERIALS RESEARCH EXPRESS
Volume 5, Issue 1, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/2053-1591/aaa653
Keywords
epsilon-near-zero; atomic layer deposition; plasmonics; aluminum-doped zinc oxide; nanophotonics
Categories
Funding
- Defense Advanced Research Projects Agency [N66001-17-1-4047]
- Young Investigator Development Program
- Undergraduate Research and Scholarly Achievement (URSA) Program
- Vice Provost for Research at Baylor University
- Office of the Vice Provost for Research at Baylor University
Ask authors/readers for more resources
Wereport fabrication of smooth Al-doped ZnO (AZO) films < 100 nm by atomic layer deposition (ALD) with epsilon-near-zero (ENZ) frequencies in the near-infrared region controlled by deposition parameters. Excitation of the ENZ plasmon-polariton mode in the AZO films is experimentally demonstrated. The ALD growth of smooth ultra-thin AZO nanolayers with tunable ENZ frequency enables the development of ultra-compact and tunable metamaterial devices and flat nonlinear/quantum zero-index optics.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available
Share Paper
