Fabrication of Sub-Lithography-Limited Structures via Nanomasking Technique for Plasmonic Enhancement Applications

Title
Fabrication of Sub-Lithography-Limited Structures via Nanomasking Technique for Plasmonic Enhancement Applications
Authors
Keywords
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Journal
IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume 14, Issue 5, Pages 790-793
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2015-07-16
DOI
10.1109/tnano.2015.2457235

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