4.6 Article

Influence of oxygen pressure on the fs laser-induced oxidation of molybdenum thin films

Journal

OPTICAL MATERIALS EXPRESS
Volume 8, Issue 3, Pages 581-596

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OME.8.000581

Keywords

-

Funding

  1. UC MEXUS-CICESE
  2. Department of Education GAANN [23503]
  3. NSF [1545852]
  4. AFOSR/CICESE [FA9550-15-1-0142-CICESE/UCR, 16020146]

Ask authors/readers for more resources

We present a study of femtosecond (1028 nm, 230 fs, 54.7 MHz) laser processing on molybdenum (Mo) thin films. Irradiations were done under ambient air as well as pure oxygen (O-2) at various gauge pressures (4, 8, 12 and 16 psi). Our results indicate that the high heating rates associated with laser processing allow the production of different molybdenum oxides. Raman spectroscopy and scanning electron microscopy are used to characterize the molybdenum oxidation for the different irradiation and oxygen pressures parameters chosen showing a high correlation between well-defined oxidation zones and the oxygen pressure surrounding the samples during the irradiation of the Mo thin films. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available