The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering

Published 2018 View Full Article

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Title
The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering
Authors
Keywords
Magnetron sputtering systems, Evaporation, Self-sputtering, Low-pressure magnetron sputtering, High purity coatings, Coatings deposition
Journal
VACUUM
Volume 152, Issue -, Pages 156-165
Publisher
Elsevier BV
Online
2018-03-21
DOI
10.1016/j.vacuum.2018.03.020

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