Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide

Published 2018 View Full Article

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Title
Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 649, Issue -, Pages 24-29
Publisher
Elsevier BV
Online
2018-01-17
DOI
10.1016/j.tsf.2018.01.019

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