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The Influence of Heat Treatment on the Electrical Characteristics of Semi-Insulating SiC Layers Obtained by Irradiating n-SiC with High-Energy Argon Ions

Journal

TECHNICAL PHYSICS LETTERS
Volume 44, Issue 3, Pages 229-231

Publisher

MAIK NAUKA/INTERPERIODICA/SPRINGER
DOI: 10.1134/S1063785018030197

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Irradiation of crystalline n-type silicon carbide (n-SiC) with high-energy (53-MeV) argon ions was used to create near-surface semi-insulating (i-SiC) layers. The influence of subsequent heat treatment on the electrical characteristics of i-SiC layers has been studied. The most high-ohmic ion-irradiated i-SiC layers with room-temperature resistivity of no less than 1.6 x 10(13) Omega cm were obtained upon the heat treatment at 600 degrees C, whereas the resistivity of such layers heat-treated at 230 degrees C was about 5 x 10(7) Omega cm.

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