Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities

Title
Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 195, Issue -, Pages 74-85
Publisher
Elsevier BV
Online
2018-04-06
DOI
10.1016/j.mee.2018.04.005

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