High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Published 2018 View Full Article

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Title
High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication
Authors
Keywords
XPCI, Anisotropic aqueous silicon etch, Potassium Hydroxide Etching, Deep Silicon Etching
Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume -, Issue -, Pages -
Publisher
Elsevier BV
Online
2018-06-27
DOI
10.1016/j.mssp.2018.06.013

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