Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma

Published 2018 View Full Article

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Title
Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
Authors
Keywords
-
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 36, Issue 2, Pages 021508
Publisher
American Vacuum Society
Online
2018-01-18
DOI
10.1116/1.5003381

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