Article
Materials Science, Multidisciplinary
Daoming You, Yu Jiang, Yali Zhao, Wentao Guo, Manqing Tan
Summary: Silicon nitride films were deposited by ion-assisted pulsed DC reactive magnetron sputtering, and the regulation of power was found to affect the refractive index. By adjusting the ion source and target powers, the refractive index range was extended, and low extinction coefficients were obtained. The composition of the films varied with power, covering nitride-rich to silicon-rich. This study proposed a method for depositing silicon nitride films with a widely tunable refractive index range, which has potential applications in optical thin films and waveguides.
Article
Instruments & Instrumentation
Daoming You, Yu Jiang, Yingchun Cao, Wentao Guo, Manqing Tan
Summary: With the development of silicon-based photonics, silica and silicon nitride anti-reflection coatings with tunable refractive index were deposited by ion-assisted reactive magnetron sputtering. The optimized coatings exhibited average reflectance of 0.74% for single-layer and below 0.35% for multi-layer coatings. These coatings have broadband low reflectance and high deposition quality, making them suitable for optical communication devices.
INFRARED PHYSICS & TECHNOLOGY
(2023)
Article
Chemistry, Multidisciplinary
Grzegorz Wisz, Paulina Sawicka-Chudy, Maciej Sibinski, Dariusz Ploch, Mariusz Bester, Marian Cholewa, Janusz Wozny, Rostyslav Yavorskyi, Lyubomyr Nykyruy, Marta Ruszala
Summary: In this study, titanium dioxide/copper oxide thin-film solar cells were prepared using the reactive direct-current magnetron sputtering technique. The influence of the deposition time of the top Cu contact layer on the structural and electrical properties of photovoltaic devices was analyzed. The structural and morphological characterization of the TiO2/CuO/Cu2O solar cells was fully studied using X-ray diffraction (XRD), scanning electron microscopy (SEM), and current-voltage (I-V) characteristics.
Article
Materials Science, Multidisciplinary
I Sierra-Cruz, R. Sangines, J. Cruz, R. Machorro-Mejia
Summary: The study proposes that real-time implementation of plasma optical emission spectroscopy can simplify the pursuit of optimal parameters for the synthesis of TiN thin films by reactive sputtering. It also explores the relationship between film composition and plasma optical emission results, as well as the correlation between N-2/Ar flow ratio and oxygen inclusion in the films.
Article
Materials Science, Multidisciplinary
Claudia P. Mejia, Henry S. Vanegas, Jhon J. Olaya
Summary: The formation of nanostructured transition metal nitride coatings by introducing a small amount of silver has been proven to enhance the physical properties of these materials. This investigation studied the influence of silver on the chemical composition, morphology, and microstructure of ZrN coatings, as well as their functional properties including corrosion resistance and optical reflectance. The results showed that the incorporation of silver improved the corrosion resistance and increased the optical reflectance of the coatings, making them potentially useful as optical protective coatings.
Article
Crystallography
Nguentra Sucheewa, Winadda Wongwiriyapan, Annop Klamchuen, Michiko Obata, Masatsugu Fujishige, Kenji Takeuchi, Tossaporn Lertvanithphol, Tuksadon Wutikhun, Saifon Kullyakool, Wanwalee Auttasiri, Nataporn Sowasod, Theerayut Prataen, Wiwut Tanthapanichakoon, Jiti Nukeaw
Summary: This study successfully demonstrated the tailoring properties of HfN thin films via reactive gas-timing RF magnetron sputtering for SERS substrate applications. The RGT technique can fabricate HfN thin films with controlled properties, such as grain size and chemical composition, resulting in an increase in the hot spot effect.
Article
Engineering, Electrical & Electronic
Daoming You, Weihua Liu, Yu Jiang, Yingchun Cao, Wentao Guo, Manqing Tan
Summary: Silicon nitride films were deposited using reactive magnetron sputtering with ion assistance, which significantly affected their optical properties and composition. The refractive index decreased from 2.87 to 2.17, the extinction coefficient decreased from 0.1535 to 0.0031 (@492 nm), and the nitrogen-to-silicon ratio increased from 0.612 to 0.955. The ion-assisted films also had lower roughness and fewer impurities. Ion assistance showed a considerable effect on silicon nitride films and has potential applications in processing them and other semiconductor thin films.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
(2023)
Article
Chemistry, Physical
Diyar A. Taher, Mohammed A. Hameed
Summary: Silicon nitride thin films were prepared using different type of conductivity (n-type and p-type) silicon targets and gas mixtures with varying ratios (50:50 and 70:30) through dc reactive magnetron sputtering technique. The structural and hardness properties of the films were investigated, showing that the type of conductivity and gas mixing ratio affected the film characteristics. Lower nitrogen content in the gas mixture resulted in silicon nitride nanostructures with residual unbounded silicon atoms and larger particle size. Films prepared from n-type silicon target exhibited higher homogeneity, while films prepared from p-type silicon target exhibited higher hardness.
Article
Chemistry, Physical
Masami Aono, Masami Terauchi, Kyoji Morita, Tasuku Inoue, Kazuhiro Kanda, Ken Yonezawa
Summary: In this study, a-CNx thin films were deposited through RF magnetron sputtering with increasing nitrogen gas pressure to provide nitrogen radicals at high concentrations. The films' chemical bonding structures were evaluated using XPS, SXES, and NEXAFS, and compared with films deposited under uniform gas pressure. Increasing the gas pressure around the graphite target slightly increased the deposition rate and changed the chemical bonding structure of a-CNx films. However, the nitrogen content did not increase with the nitrogen gas pressure. The nitrogen incorporation in a-CNx films was more effective at higher RF powers, as indicated by SXES and NEXAFS spectra.
APPLIED SURFACE SCIENCE
(2023)
Article
Chemistry, Physical
N. A. Richter, B. Yang, J. P. Barnard, T. Niu, X. Sheng, D. Shaw, M. Watanabe, G. Rane, U. Krause, P. Duerrenfeld, H. Wang, X. Zhang
Summary: In this study, the influence of bipolar pulsed direct current (DC) magnetron sputtering on the microstructure evolution of titanium nitride (TiN) coatings is explored and compared with conventional DC sputtering. The implementation of pulsed DC voltage promotes a drastic texture change from randomly oriented polycrystals to (111) textured TiN coatings across various Si substrates, including amorphous SiO2. Higher pulse frequencies contribute to significant grain size reduction, resulting in increased hardness and wear resistance. The potential mechanism for this microstructural and texture evolution is also investigated.
APPLIED SURFACE SCIENCE
(2023)
Article
Materials Science, Multidisciplinary
Ivan Castillo, Karuna Kara Mishra, Ram S. Katiyar
Summary: Vanadium sesquioxide (V2O3) is an important transition metal oxide with potential applications in electronic and memory devices. Thin films of V2O3 were successfully deposited on Si/SiO2/Ti/Pt substrates, exhibiting good crystallinity and composition. The films also showed interesting magnetic behavior at low temperatures. Raman spectroscopy studies provided further insights into the phase transition.
Article
Crystallography
Xiaolei Ye, Li Yang, Huan Luo, Pierre Bertrand, Alain Billard, Pascal Briois
Summary: In this work, Bi1.5Y0.5O3 compound was deposited using metallic targets of Bi and Y, with investigation on the effects of atomic ratio and annealing temperature on film properties. By adjusting the atomic ratio of Bi to Y, a dense Bi1.5Y0.5O3 film with high ionic conductivity was obtained.
Article
Chemistry, Physical
Petr Hruska, Frantisek Lukac, Stanislav Cichon, Martin Vondracek, Jakub Cizek, Ladislav Fekete, Jan Lancok, Jozef Vesely, Peter Minarik, Miroslav Cieslar, Oksana Melikhova, Tomas Kmjec, Maciej Oskar Liedke, Maik Butterling, Andreas Wagner
Summary: High entropy alloys are a new type of materials with unique physical properties due to single-phase solid solutions of multiple elements. Nanostructured or amorphous thin films offer increased effective surface area and high intergranular diffusion. The study of HfNbTaTiZr thin films deposited at room temperature showed a cellular structure with fine substructure, close to equimolar composition, and oxidation leading to the formation of oxide clusters.
JOURNAL OF ALLOYS AND COMPOUNDS
(2021)
Article
Nanoscience & Nanotechnology
Sabine Schmidt, Tobias Haensch, Ronny Frank, Heinz-Georg Jahnke, Andrea A. Robitzki
Summary: In this study, a silicon nitride (SiN) passivation was established by physical vapor deposition (PVD) and evaluated for impedance spectroscopy-based monitoring of cells. The findings showed that SiN is a suitable alternative passivation, with significantly higher cell signals observed on microelectrodes larger than 50 μm in diameter. Additionally, the SiN passivation layer demonstrated high compatibility for bonding with PEGDA and PDMS microfluidic structures without any leakage.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Physics, Applied
Allen Vincent B. Catapang, Jose Gabriel F. Abalos, James Edward I. I. A. Hernandez, Magdaleno R. R. Vasquez Jr., Motoi Wada
Summary: The effect of varying the water vapor content in a DC magnetron sputtering process on zinc oxide film formation was investigated. Plasma parameters near the substrate surface were measured using a single Langmuir probe, and the deposited films were characterized using various methods. The addition of water changed the plasma properties near the substrate surface, resulting in a transition in the film growth mechanism from Zn to ZnO. Depositing at 40% water content resulted in a highly transparent film with a resistivity of 1.20 Ωcm. The band gap of films deposited at 40%-100% water content ranged from 3.36 to 3.34 eV, indicating shallow hydrogen donor doping in ZnO.
JAPANESE JOURNAL OF APPLIED PHYSICS
(2023)
Article
Chemistry, Physical
F. E. Loranca-Ramos, C. J. Diliegros-Godines, R. Silva Gonzalez, Mou Pal
APPLIED SURFACE SCIENCE
(2018)
Article
Materials Science, Multidisciplinary
C. J. Diliegros-Godines, J. Santos Cruz, N. R. Mathews, Mou Pal
JOURNAL OF MATERIALS SCIENCE
(2018)
Article
Materials Science, Multidisciplinary
O. Hernandez Utrera, N. Abundiz-Cisneros, R. Sangines, C. J. Diliegros-Godines, R. Machorro
Article
Materials Science, Multidisciplinary
C. J. Diliegros-Godines, D. Lombardero-Juarez, R. Machorro-Mejia, R. Silva Gonzalez, Mou Pal
Article
Physics, Applied
J. Cruz, R. Sangines, N. Abundiz-Cisneros, J. Aguila-Munoz, S. Muhl, R. Machorro-Mejia
JOURNAL OF PHYSICS D-APPLIED PHYSICS
(2019)
Article
Construction & Building Technology
N. Abundiz-Cisneros, R. Sangines, R. Rodriguez-Lopez, M. Peralta-Arriola, J. Cruz, R. Machorro
ENERGY AND BUILDINGS
(2020)
Article
Energy & Fuels
Mou Pal, C. J. Diliegros-Godines, Goutam K. Gupta, N. R. Mathews, Ambesh Dixit
INTERNATIONAL JOURNAL OF ENERGY RESEARCH
(2020)
Article
Engineering, Electrical & Electronic
C. J. Diliegros-Godines, R. Castanedo-Perez, G. Torres-Delgado, A. Elias-Zuniga, F. J. Flores-Ruiz
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
(2020)
Article
Materials Science, Multidisciplinary
I Sierra-Cruz, R. Sangines, J. Cruz, R. Machorro-Mejia
Summary: The study proposes that real-time implementation of plasma optical emission spectroscopy can simplify the pursuit of optimal parameters for the synthesis of TiN thin films by reactive sputtering. It also explores the relationship between film composition and plasma optical emission results, as well as the correlation between N-2/Ar flow ratio and oxygen inclusion in the films.
Article
Physics, Applied
J. Cruz, R. Sangines, G. Soto-Valle, S. Muhl, I Sierra, O. De Lucio-Morales, J. L. Ruvalcaba, A. Mitrani, R. M. Calderon-Olvera, R. Mendoza-Perez, R. Machorro-Mejia
Summary: By doping a sputtering target with atoms of higher atomic mass, the sputtering yield amplification (SYA) phenomenon can be achieved, promoting a higher ejection of target atoms. A new method of generating the SYA phenomenon without the need for expensive and complex deposition systems was presented by increasing working pressure and adding dopant elements. Experimental results showed that the percentage of SYA depends on the number of redeposited dopant atoms and their depth distribution on the target surface.
JOURNAL OF PHYSICS D-APPLIED PHYSICS
(2021)
Article
Materials Science, Multidisciplinary
R. Rodriguez-Lopez, G. Soto-Valle, R. Sangines, N. Abundiz-Cisneros, J. Aguila-Munoz, J. Cruz, R. Machorro-Mejia
Summary: The deposition parameters of silicon nitride in reactive direct-current magnetron sputtering were studied to optimize the synthesis process. The characterization protocol included optical emission spectroscopy to observe changes in plasma and spectroscopic ellipsometry for optical property measurement.
Article
Materials Science, Ceramics
C. J. Diliegros-Godines, O. Garcia-Zaldivar, F. J. Flores-Ruiz, E. Fernandez-Dominguez, G. Torres-Delgado, R. Castanedo-Perez
Summary: In this study, impedance spectroscopy (IS) was used to investigate CdS/CdTe-based solar cells. The physical parameters of the cell were calculated in the dynamic regime to obtain information about the capacitive, resistive processes, and characteristic response times inside the device. The impedance spectra were fitted with an equivalent circuit to accurately describe the physical parameters and the overall response of the device. Experimental and numerical approaches were used to calculate the short-circuit current density Jsc of the cell and compare it with the experimental curve, showing good agreement.
CERAMICS INTERNATIONAL
(2023)
