4.6 Article

Impact of Doping Concentration on Electronic Properties of Transition Metal-Doped Monolayer Molybdenum Disulfide

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 65, Issue 2, Pages 733-738

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2017.2782667

Keywords

2-D materials; doping; electronics structure; first-principles calculation; molybdenum disulfide

Funding

  1. Ministry of Science and Technology, Taiwan [105-2221-E-009-132, 106-2221-E-009-149]
  2. Taiwan Semiconductor Manufacturing Company

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Doping engineering has been an emerging topic in monolayer molybdenum disulfide (mMoS(2)). However, the dopants used for an n-or p-type device and the effect of doping level are of great interests toward nextgeneration electronic devices. In this paper, we theoretically reveal the work function tunability of mMoS(2) doped by 3d transition metals. We found that the titanium dopant forms a deep-level trap in the midgap of mMoS(2) but turning into n-type donor levels in high doping concentration due to the stronger covalent bond and the stable surface morphology, which renders it the widest work function tunability among 3d transitionmetals. Overall, the n-typebehavior is expected by doping with chromium, copper, scandium, and titanium, whereas nickel and zinc dopants lead to the p-type property. The findings feature the selection of dopants for the revolutionary device and highlight the impact of doping levels from the atomistic viewpoint.

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