Highly transparent 3D NiO-Ni/Ag-nanowires/FTO micro-supercapacitor electrodes for fully transparent electronic device purpose

In this work, the 3D NiO-Ni/ANWs/FTO electrode for micro-supercapacitor application is fabricated by facile electrochemical deposition and post annealing process. At the optimal under annealing conditions, the composite electrodes demonstrate an excellent specific capacity up to 344 mAh g(-1) at 2.5 A g(-1) based on GCD result in 2 mol L-1 KOH as electrolyte. In particular, our original welding treatment by rapidly annealing process of the 3D ANWs network dramatically increases the lifetime and stability, similar to 100% capacitance retention after 20000 cycles. Meanwhile, the NiO-Ni/ANWs composite own high average transmittance in visible and near infra-red regions as high as 82%, which is suitable for fully transparent electronic device application. For on-chip purpose the FTO substrate has perfect compatibility can also be easily replaced by any shape or form p/n-Si, metal, semiconductor, and any other conductive substrates. (c) 2017 Elsevier Ltd. All rights reserved.