Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

Title
Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)
Authors
Keywords
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Journal
ACS Applied Materials & Interfaces
Volume 7, Issue 30, Pages 16428-16439
Publisher
American Chemical Society (ACS)
Online
2015-07-10
DOI
10.1021/acsami.5b03598

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