Molecular oxidation of surface –CH 3 during atomic layer deposition of Al 2 O 3 with H 2 O, H 2 O 2 , and O 3 : A theoretical study

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Title
Molecular oxidation of surface –CH 3 during atomic layer deposition of Al 2 O 3 with H 2 O, H 2 O 2 , and O 3 : A theoretical study
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 457, Issue -, Pages 376-380
Publisher
Elsevier BV
Online
2018-06-19
DOI
10.1016/j.apsusc.2018.06.160

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