4.8 Article

Facile One-Step Photolithographic Method for Engineering Hierarchically Nano/Microstructured Transparent Superamphiphobic Surfaces

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 7, Issue 20, Pages 10988-10992

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.5b01926

Keywords

superoleophobicity; superamphiphobicity; photolithography; hierarchical structure; photoresist; spontaneous emulsification

Funding

  1. Ontario Research Fund Research Excellence (ORF-RE) program of Ministry of Research and Innovation
  2. LANXESS Inc
  3. Natural Science and Engineering Research Council of Canada (NSERC)
  4. Canada Foundation for Innovation (CFI)

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It is of great value to develop a simple, controllable, and scalable method of making Superamphiphobic surfaces Here we present a facile one-step photolithographic method to engineer superamphiphobic surfaces consisting of photoresist micropillars decorated with nanoparticles of the same,potoresist. The surface or coating is Optically transparent and versatile, and can be fabricated On a, broad range of substrates including stretchable elastomers. During the development of the micropillar, array, photoresist nanoparticles are spontaneously gown On the micropillars by a well-controlled emulsification process of the un-cross-linked residual photoresist. This creates a hierarchical structure with a re-entrant and convex morphology which is the key for superoleophobicity. The chemical bonding between the nanoparticles and the micropillars is strong producing a robust and durable coating. This facile method is scalable and industry-applicable for a variety of applications such as self-cleaning, antifouling, and deicing/antifrosting.

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