4.6 Article

234 nm and 246 nm AlN-Delta-GaN quantum well deep ultraviolet light-emitting diodes

Journal

APPLIED PHYSICS LETTERS
Volume 112, Issue 1, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.5007835

Keywords

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Funding

  1. Kate Gleason endowed professorship fund from Rochester Institute of Technology
  2. Office of Naval Research [N00014-16-1-2524]
  3. University of Notre Dame
  4. NSF DMREF Program [1534303]

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Deep ultraviolet (DUV) AlN-delta-GaN quantum well (QW) light-emitting diodes (LEDs) with emission wavelengths of 234 nm and 246 nm are proposed and demonstrated in this work. Our results reveal that the use of AlN-delta-GaN QW with similar to 1-3 monolayer GaN delta-layer can achieve a large transverse electric (TE)-polarized spontaneous emission rate instead of transverse magnetic-polarized emission, contrary to what is observed in conventional AlGaN QW in the 230-250 nm wavelength regime. The switching of light polarization in the proposed AlN-delta-GaN QW active region is attributed to the rearrangement of the valence subbands near the Gamma-point. The light radiation patterns obtained from angle-dependent electroluminescence measurements for the Molecular Beam Epitaxy (MBE)-grown 234 nm and 246 nm AlN-delta-GaN QW LEDs show that the photons are mainly emitted towards the surface rather than the edge, consistent with the simulated patterns achieved by the finite-difference time-domain modeling. The results demonstrate that the proposed AlN-delta-GaN QWs would potentially lead to high-efficiency TE-polarized surface-emitting DUV LEDs. Published by AIP Publishing.

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