Article
Chemistry, Multidisciplinary
Liangge Xu, Jinye Yang, Kun Li, Lei Yang, Jiaqi Zhu
Summary: This study investigates the effect of post-deposition annealing process on the microstructure and optoelectronic properties of indium-hydroxide-doped thin films. The results show that the annealed films have high carrier mobility and transmittance, and exhibit excellent shielding performance against radar electromagnetic waves. This provides a guideline for fabricating lightweight, thin, and multi-functional shielding infrared transparent materials.
Article
Nanoscience & Nanotechnology
Yi Li, Jamie P. Wooding, Emily K. McGuinness, Yici Sun, Mark D. Losego
Summary: Cellulosic materials are widely used in daily life and have numerous applications, including sustainable packaging and medical diagnostics. This study introduces a new modification method using ALD and atmospheric heating to alter the wettability of cellulosic chromatography paper, making it superhydrophobic. The modified surface shows increased adsorption of adventitious carbon upon heating and can transition reversibly between hydrophilic and hydrophobic states. The ability to spatially pattern wettability on the treated paper opens up possibilities for microliter droplet manipulation and patterned lab-on-paper devices.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Chemistry, Multidisciplinary
Tzu-Ling Liu, Stacey F. Bent
Summary: This study presents a strategy to enhance the blocking ability of dodecanethiol (DDT) self-assembled monolayers (SAMs) against Al2O3 ALD by conducting DDT deposition on a slightly oxidized Cu surface. It is found that DDT SAMs formed on Cu2O-covered Cu substrates are about 3-4 times more effective in blocking Al2O3 than those on acid-etched Cu surfaces under subsaturation condition.
ADVANCED MATERIALS INTERFACES
(2022)
Article
Chemistry, Multidisciplinary
Jingwei Shi, Stacey F. Bent
Summary: Ionic liquid assisted MLD (IL-MLD) is an improved technique that expands the range of chemical reactions and overcomes limitations of traditional MLD by using ionic liquids. IL-MLD enables the synthesis of polymers and may be applied to other vapor deposition techniques.
Review
Chemistry, Physical
Lionel Santinacci
Summary: Atomic layer deposition (ALD) is a widely used method for growing thin films, especially in the industrial fabrication processes of microelectronics and luminescent display technologies. It has the potential for various applications such as energy, sensing, biomaterials, and photonics due to its ability to grow compact and conformal films with precise thickness control. Although there are few reports on ALD's application to corrosion protection, it has been shown to have significant benefits in this field. This report provides a brief overview of ALD's principle, the impact of main parameters on film properties, and reviews successful examples of ALD being used to protect metallic and non-metallic surfaces in different fields.
CURRENT OPINION IN COLLOID & INTERFACE SCIENCE
(2023)
Article
Chemistry, Physical
Yeonsik Choi, Hyunwoo Park, Namgue Lee, Byunguk Kim, Junghoon Lee, Gucheol Lee, Hyeongtag Jeon
Summary: Tin sulfide thin films deposited by ALD exhibit unique properties with two phases, SnS and SnS2, which can be applied in various technologies. This study investigates the phase transition of tin sulfides through post-annealing at different temperatures, analyzing the effects on phase, crystal structure, chemical bonding, and electronic band structures. The study reveals that the annealing temperature affects the characteristics of the thin films, transitioning from n-type to p-type with increasing temperatures. The findings can provide insights into fabricating desired films for applications in diverse devices.
JOURNAL OF ALLOYS AND COMPOUNDS
(2022)
Review
Chemistry, Multidisciplinary
William Chiappim, Benedito Botan Neto, Michaela Shiotani, Julia Karnopp, Luan Goncalves, Joao Pedro Chaves, Argemiro da Silva Sobrinho, Joaquim Pratas Leitao, Mariana Fraga, Rodrigo Pessoa
Summary: The increasing demand for miniaturized devices has led to high importance and requirements for nanofabrication technologies that are of high-quality, low temperatures, and low cost. In recent years, the development of atomic layer deposition (ALD) processes has sparked interest in their use in advanced electronic and nano/microelectromechanical systems (NEMS/MEMS) device manufacturing. Non-thermal plasma (NTP) technology has emerged as a significant technique that expands the process window of ALD and allows the fabrication of various nanomaterials at lower temperatures, enabling the coverage of thermosensitive substrates with good formability and uniformity. This review article comprehensively describes the impact of NTP on the ALD universe and its applications in device fabrication. It also presents the integration of NTP and ALD technologies to form the plasma-assisted ALD (PA-ALD) technique, which has been successfully used in nanofabrication and surface modification. The advantages and limitations of this technique are discussed, along with the introduction of atomic layer etching (ALE) technique, another development of the NTP and ALD junction that has gained attention for plasma-assisted nanofabrication.
Article
Nanoscience & Nanotechnology
Ming-Hung Tseng, Dung-Yue Su, Guan-Lun Chen, Feng-Yu Tsai
Summary: The nanolaminated polymer/metal oxide stretchable moisture-barrier films fabricated by a novel ALD/MLD process demonstrate high tolerance against mechanical strain and minimize moisture-induced swelling, making them a significant breakthrough for wearable/flexible electronics technologies.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Chemistry, Physical
Maofan Zhou, Xuefei Xu, Gengping Wan, Pengpeng Mou, Shengjie Teng, Guizhen Wang
Summary: In this study, we fabricated ZnO/AC/Graphene hybrid films as multifunctional materials for heat conduction and microwave absorption. The films showed excellent performance in terms of reflection loss and absorption bandwidth. The absorption frequency could be adjusted by changing the ZnO/AC. The results of this work provide a novel strategy for the design of functional materials for heat-conduction microwave absorption applications.
Article
Chemistry, Multidisciplinary
Yue Yang, Xiao-Ying Zhang, Chen Wang, Fang-Bin Ren, Run-Feng Zhu, Chia-Hsun Hsu, Wan-Yu Wu, Dong-Sing Wuu, Peng Gao, Yu-Jiao Ruan, Shui-Yang Lien, Wen-Zhang Zhu
Summary: Amorphous gallium oxide thin films were grown using plasma-enhanced atomic layer deposition. The films exhibited decreasing band gap energy and increased density as the temperature increased. The higher substrate temperature also resulted in increased surface roughness. Films grown at temperatures below 200 degrees C were amorphous, while the film grown at 250 degrees C showed slight crystallinity.
Article
Chemistry, Physical
Seon Yong Kim, Yong Chan Jung, Sejong Seong, Taehoon Lee, In-Sung Park, Jinho Ahn
Summary: The growth of HfOx films using La(NO3)(3)center dot 6H(2)O solution as an oxidant was investigated in comparison to films grown using conventional oxidant H2O. The films grown with LNS showed smaller crystallites, more suboxides or defects, and different preferred orientations compared to those grown with H2O. These differences were attributed to a variation in surface energy between the two deposition processes. A film growth model based on surface energy difference was proposed to explain the observed trends in growth rate and crystallite size.
Article
Engineering, Electrical & Electronic
Sumit R. Patil, Viral N. Barhate, Vilas S. Patil, Khushabu S. Agrawal, Ashok M. Mahajan
Summary: The study investigates the effects of plasma-enhance atomic layer deposition (PEALD) on ZrO2/La2O3/ZrO2 (ZLZ) nanolaminates and the impact of different annealing temperatures. The film annealed at 400 degrees C exhibits a stable pyrochlore phase, resulting in the lowest leakage current density in the MIM capacitor. The research suggests that PEALD nanolaminated high-k MIM capacitors have potential applications in nanoelectronics.
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
(2022)
Article
Nanoscience & Nanotechnology
Yachen Xu, Huimin Chen, Haiyang Xu, Minyu Chen, Pengchao Zhou, Shuzhe Li, Ge Zhang, Wei Shi, Xuyong Yang, Xingwei Ding, Bin Wei
Summary: In this study, a composite structure composed of Al2O3/HfO2 with different Al2O3/HfO2 cycles prepared by atomic layer deposition (ALD) was designed to obtain high-quality ultrathin (1-12 nm) dielectric films. The film exhibited a layer growth mode and physically formed at 3 nm, with the electrically stable film thickness being 10 nm. The ALD-prepared composite strategy provides a simple and practical way to obtain high-quality dielectric films.
ACS APPLIED MATERIALS & INTERFACES
(2023)
Review
Chemistry, Multidisciplinary
Youngjun Kim, Whang Je Woo, Donghyun Kim, Sangyoon Lee, Seung-min Chung, Jusang Park, Hyungjun Kim
Summary: The synthesis and modulation of 2D transition metal chalcogenides by ALD play a crucial role in nanoelectronics, sensors, and energy applications.
ADVANCED MATERIALS
(2021)
Article
Chemistry, Physical
Hongyan Xu, Mohammad Karbalaei Akbari, Siyan Wang, Shuhang Chen, Eugene Kats, Francis Verpoort, Jie Hu, Serge Zhuiykov
Summary: Thin MoO3 films were fabricated using atomic layer deposition technique, and their crystalline phase stabilization and oxygen vacancies enhancement were observed after annealing. The films exhibited memristive and opto-synaptic functionalities under infrared light illumination, which could simplify circuits in advanced opto-electronic systems and neuro-optoelectronic instruments.
APPLIED SURFACE SCIENCE
(2022)
Article
Materials Science, Textiles
Keshuai Liu, Duo Xu, Junlong Ni, Jiang Wei, Shengming Yang, Xiaoguang Xu, Wan Li, Xinling Zhang, Bo Deng, Weilin Xu
TEXTILE RESEARCH JOURNAL
(2019)
Article
Nanoscience & Nanotechnology
Huiyu Yang, Zhenwei Yu, Ke Li, Lang Jiang, Xin Liu, Bo Deng, Fengxiang Chen, Weilin Xu
ACS APPLIED MATERIALS & INTERFACES
(2019)
Article
Materials Science, Paper & Wood
Lang Jiang, Ke Li, Huiyu Yang, Xin Liu, Wei Li, Weilin Xu, Bo Deng
Article
Materials Science, Paper & Wood
Huiyu Yang, Ke Li, Weiqiang Liu, Xin Liu, Weilin Xu, Bo Deng
Article
Nanoscience & Nanotechnology
Chunhua Zhang, Liangjun Xia, Bo Deng, Chen Li, Yun Wang, Renhao Li, Fangyin Dai, Xin Liu, Weilin Xu
ACS APPLIED MATERIALS & INTERFACES
(2020)
Article
Materials Science, Textiles
Dan Sheng, Bo Deng, Yunli Wang, Ling Liu, Xin Chen, Honghui Xia, Genyang Cao, Weilin Xu
Summary: The aggregation behaviors of Basic Red 46 in different solvents, electric conductivity and surface zeta potential of dye aggregates, dyeing mechanism and adsorption isotherms of MPIA, adsorption kinetics onto MPIA, and washing and rubbing fastness of dyed MPIA were investigated and analyzed in this study.
TEXTILE RESEARCH JOURNAL
(2021)
Article
Materials Science, Textiles
Huiyu Yang, Hongzhen Deng, Lisha Zhai, Bo Deng
Summary: The internal structure and composition of Juncus effuses (JE) plant fiber were analyzed, and the filtration performance of JE filters of varying lengths against different sizes of particles was compared.
JOURNAL OF NATURAL FIBERS
(2022)
Article
Polymer Science
Ke Li, Huiyu Yang, Lang Jiang, Xin Liu, Peng Lang, Bo Deng, Na Li, Weilin Xu
Article
Chemistry, Applied
Haona Wang, Li Kong, Honghui Xia, Jie Min Huang, Bo Deng, Heng Pan
Summary: The research found that hair sampled from 26-year-olds exhibited the most suitable properties for wig-making, with the highest number density and lowest size of melanin granules, as well as the best bleaching outcomes.
COLORATION TECHNOLOGY
(2021)
Article
Materials Science, Textiles
Xin Chen, Bingqian Liu, Dan Sheng, Honghui Xia, Heng Pan, Dongmei Wang, Bo Deng, Genyang Cao
Summary: The study found that pre-treatment with 2-phenoxyethanol increased the surface-anchored oxygen atom amount on TLCP fibers, enhancing their adhesive properties without significantly affecting their thermal stability or mechanical properties. The peeling strength of TLCP fabric treated with 2-phenoxyethanol was approximately double that of the control fabric.
TEXTILE RESEARCH JOURNAL
(2021)
Article
Materials Science, Textiles
Shan Jiang, Bingqian Liu, Xin Chen, Dan Sheng, Honghui Xia, Bo Deng, Genyang Cao
Summary: The dyeing property of TLCP fibers was investigated and improved using UV irradiation-induced grafting, which resulted in better dye uptake of C.I. Basic Red 46. The AAc-grafted TLCP fibers showed rougher surface with many pits, while maintaining the crystalline structure unchanged, due to the successful introduction of carboxyl groups onto the fiber surface. This study provides a simple and efficient method for enhancing the cationic dyeing performance of TLCP fabrics.
TEXTILE RESEARCH JOURNAL
(2022)
Article
Nanoscience & Nanotechnology
Huiyu Yang, Jingyi Zhou, Zijiang Duan, Bin Lu, Bo Deng, Weilin Xu
Summary: Structural coloration is an important method for eco-friendly dyeing of textiles. By fabricating a polydopamine film on the surface of cotton fabric, structural color can be achieved with enhanced interfacial bond strength and improved color fastness through the introduction of hydrogen bonds.
ACS APPLIED MATERIALS & INTERFACES
(2022)
Article
Chemistry, Physical
Yahui Zhou, Xingxin Lei, Dali Yan, Jian Ye, Bo Deng, Weilin Xu
Summary: This study investigates the relative contributions of V-Mn and VO in the photocatalytic process using MnO2 by synthesizing catalysts with different levels of manganese vacancies (V-Mn) and both V-Mn and oxygen vacancies (VO). The results show that V-Mn has a higher contribution due to its induced formation of a continuous band gap on the crystal surface, which is favorable for visible light absorption and carrier transport.
CATALYSIS SCIENCE & TECHNOLOGY
(2023)
Article
Materials Science, Multidisciplinary
Zijian Duan, Xinqing Li, Bo Deng
Summary: Nano-sized MgO has excellent properties including thermal stability, non-toxicity, environmental friendliness, and can be used for various applications such as antimicrobial agents and fire retardants. However, practical applications are still limited and need further promotion.
BULLETIN OF MATERIALS SCIENCE
(2022)
Article
Chemistry, Physical
Huiyu Yang, Lisha Zhai, Ke Li, Xin Liu, Bo Deng, Weilin Xu
CATALYSIS SCIENCE & TECHNOLOGY
(2020)
