Article
Engineering, Electrical & Electronic
Sang-Kon Kim
Summary: This paper discusses the use of BCP self-assembly and metal-deposition method to produce Au NP arrays with narrow gaps. Simulation results show that both the diameter of the cylinder post and gap size increase with the polymerization degree (N), while decrease with the increase of the Flory-Huggins interaction parameter x.
JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS
(2021)
Article
Chemistry, Multidisciplinary
Runze Liu, Hejin Huang, Zehao Sun, Alfredo Alexander-Katz, Caroline A. Ross
Summary: This study presents a method of directed self-assembly using multiple mechanisms to generate well-aligned nanomesh structures, which is then extended to fabricate multi-component metallic structures with 2D/3D hybrid morphologies.
Article
Polymer Science
Hanwen Lai, Xiaohui Zhang, Guangcheng Huang, Yadong Liu, Weihua Li, Shengxiang Ji
Summary: This study reports the synthesis and self-assembly of poly (styrene -b-vinyl acetate) (PS-b-PVAc) and demonstrates its potential as a block copolymer (BCP) for next-generation directed self-assembly (DSA) lithography. The PS-b-PVAc has a higher Flory-Huggins interaction parameter and can achieve a minimum feature size of 18.2 nm. The parallel orientation of domains is obtained when PS and PVAc are annealed on random copolymer brushes. The DSA of PS-b-PVAc is successfully demonstrated in thin films on chemical patterns, with a feature size down to 9.5 nm and 2x density multiplication.
Article
Chemistry, Applied
Farnaz Farbod, Fatemeh Goharpey, Mehdi Salami-Kalajahi, Hossein Ali Khonakdar
Summary: Utilizing the advantages of block copolymers, such as pattern density multiplication and improvement in feature size uniformity, can effectively address the challenges faced by the semiconductor industry. This research demonstrates that polystyrene block polyacrylic acid (PS-b-PAA) is a promising candidate for achieving sub-10 nm and less defective patterns.
REACTIVE & FUNCTIONAL POLYMERS
(2022)
Article
Polymer Science
Andrew Selkirk, Nadezda Prochukhan, Ross Lundy, Cian Cummins, Riley Gatensby, Rachel Kilbride, Andrew Parnell, Jhonattan Baez Vasquez, Michael Morris, Parvaneh Mokarian-Tabari
Summary: This study overcomes the kinetic challenges in the self-assembly of UHMW BCPs through precision solvent annealing, resulting in highly ordered large-period lamellar domains. The research reveals that film thickness and solvent concentration significantly affect the domain morphology.
Article
Multidisciplinary Sciences
Zhiyuan Qu, Peng Zhou, Fanyi Min, Shengnan Chen, Mengmeng Guo, Zhandong Huang, Shiyang Ji, Yongli Yan, Xiaodong Yin, Hanqiu Jiang, Yubin Ke, Yong Sheng Zhao, Xuehai Yan, Yali Qiao, Yanlin Song
Summary: We propose a bubble-template molecular printing concept that utilizes ultrathin liquid films to confine the self-assembly of molecules, achieving high-precision assembly at the molecular scale.
Article
Polymer Science
Ki Hyun Kim, Yoon Huh, Inkyu Song, Du Yeol Ryu, Jeong Gon Son, Joona Bang
Summary: This article presents a perspective on recent developments in block copolymers (BCPs) and bottlebrush block copolymers (BBCPs), focusing on their potential in creating nanostructures. The first part discusses the progress made in high-chi linear BCPs derived from conventional poly(styrene-b-methyl methacrylate) (PS-b-PMMA) pairs. The second part reviews the literature on BBCPs that have the ability to form supra-100 nm nanostructures. The future prospects of BCP lithography are also discussed.
JOURNAL OF POLYMER SCIENCE
(2023)
Article
Nanoscience & Nanotechnology
Jiajing Li, Paulina A. Rincon-Delgadillo, Hyo Seon Suh, Geert Mannaert, Paul F. Nealey
Summary: Directed self-assembly of block copolymers has attracted interest from the semiconductor industry due to its potential for achieving semiconductor-relevant structures with a relatively simple and low-cost process. However, the kinetic trapping of self-assembling structures into defective states poses challenges for high-volume manufacturing. A study on the kinetics of defect annihilation in chemoepitaxy DSA revealed a statistical model that suggests all dislocations can be removed by sufficiently long annealing time. Further analysis showed that the distribution of defects is largely influenced by the role of guiding stripes.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Chemistry, Multidisciplinary
Youjin Park, Hyowon Han, Hyeokjung Lee, Sohee Kim, Tae Hyun Park, Jihye Jang, Gwanho Kim, Yemin Park, Jiyeon Lee, Dongjun Kim, Jiwon Kim, Yeon Sik Jung, Beomjin Jeong, Cheolmin Park
Summary: A simple and robust method for fabricating sub-30 nm 1D nanopatterns of 2D perovskites over a large area is presented. The enhanced photoluminescence quantum yields of the nanopatterns are approximately four times greater than those of the corresponding control flat films. Additionally, the metal-coated nanopatterns of 2D perovskites can be used as color conversion optical polarizers, producing polarized photoluminescence.
Article
Nanoscience & Nanotechnology
Anette Lofstrand, Reza Jafari Jam, Johannes Svensson, Adam Jonsson, Heera Menon, Daniel Jacobsson, Lars-Erik Wernersson, Ivan Maximov
Summary: Fabricating next generation transistors requires new technological requirements, such as smaller size and higher density structures. This study demonstrates the use of directed self-assembly of block copolymer to fabricate vertical III-V nanowires with small pitch, which is important for realizing dense gate all-around transistors. It is also shown that the orientation of the block copolymer affects the facet configuration of the nanowires and their spacing.
ADVANCED ELECTRONIC MATERIALS
(2022)
Article
Nanoscience & Nanotechnology
Anette Lofstrand, Reza Jafari Jam, Karolina Mothander, Tommy Nylander, Muhammad Mumtaz, Alexei Vorobiev, Wen-Chang Chen, Redouane Borsali, Ivan Maximov
Summary: Sequential infiltration synthesis (SIS) was used to prepare nanostructured surface layers by infiltrating alumina-like material into poly(styrene)-block-maltoheptaose block copolymer under vapor-phase trimethyl aluminum and water. The preferential reaction of precursors in the maltoheptaose film compared to the hydroxyl-terminated polystyrene film was revealed by specular neutron reflectometry. The infiltration depth increased with cycle number, allowing for transfer of sub-10 nm patterns to silicon substrates at a high aspect ratio of approximately 2:1.
ACS APPLIED NANO MATERIALS
(2021)
Article
Nanoscience & Nanotechnology
Fei Yu, R. Paxton Thedford, Konrad R. Hedderick, Guillaume Freychet, Mikhail Zhernenkov, Lara A. Estroff, Katja C. Nowack, Sol M. Gruner, Ulrich B. Wiesner
Summary: Recent developments in quantum materials have shown promise in revolutionizing energy and information technologies. By utilizing block copolymers and niobia sol precursors, we successfully prepared mesoporous niobium carbonitride thin film superconductors through a scalable solution processing approach. This cost-effective and scalable method holds great potential for integration into existing microelectronics processing, combining the capabilities of soft matter self-assembly with quantum materials.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Polymer Science
Yanyan Zhu, Changhang Huang, Liangshun Zhang, David Andelman, Xingkun Man
Summary: The kinetic paths of structural evolution and formation of block copolymer (BCP) particles were investigated using dynamic self-consistent field theory (DSCFT). The study revealed that the self-assembly process of BCP in a poor solvent leads to the formation of striped ellipsoids, onion-like particles, and double-spiral lamellar particles. The shape transition between onion-like particles and striped ellipsoidal ones can be reversible by controlling the temperature and solvent selectivity. Additionally, changing the intermediate bi-continuous structure into a layered one is crucial for the formation of striped ellipsoidal particles.
MACROMOLECULAR RAPID COMMUNICATIONS
(2023)
Article
Polymer Science
Anette Lofstrand, Alexei Vorobiev, Muhammad Mumtaz, Redouane Borsali, Ivan Maximov
Summary: Vapor phase infiltration into a self-assembled block copolymer can enhance the etch selectivity for pattern transfer. By optimizing the process parameters, it was found that a high concentration of alumina infiltration can be achieved by reducing the exposure time and using appropriate precursor pulse durations. These results are significant for further understanding of the mechanisms involved in sequential infiltration synthesis and for optimizing carbohydrate-based etch masks for sub-10 nm pattern transfer.
Article
Polymer Science
Jian Sun, Changyeon Lee, Chinedum O. Osuji, Padma Gopalan
Summary: By using ATRP, a series of P3HS-b-PDMS-b-P3HS triblock copolymers were successfully synthesized, showing high etch contrast and etch versatility for sub-5 nm feature sizes. The triblocks have dispersity ranging from 1.10 to 1.26, allowing robust control over molecular weights and volume fractions. The large chemical incompatibility between the blocks enables the formation of ordered structures at low molecular weights.
Article
Polymer Science
Tamar Segal-Peretz, Chun Zhou, Jiaxing Ren, Takahiro Dazai, Leonidas E. Ocola, Ralu N. S. Divan, Paul F. Nealey
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
(2016)
Article
Chemistry, Inorganic & Nuclear
Xing-Cai Huang, Chun Zhou, Hai-Yan Wei, Xin-Yi Wang
INORGANIC CHEMISTRY
(2013)
Article
Chemistry, Inorganic & Nuclear
Xing-Cai Huang, Chun Zhou, Dong Shao, Xin-Yi Wang
INORGANIC CHEMISTRY
(2014)
Article
Chemistry, Multidisciplinary
Jae Jin Kim, Hyo Seon Suh, Chun Zhou, Anil U. Mane, Byeongdu Lee, Soojeong Kim, Jonathan D. Emery, Jeffrey W. Elam, Paul F. Nealey, Paul Fenter, Timothy T. Fister
Article
Nanoscience & Nanotechnology
Chun Zhou, Moshe Dolejsi, Shisheng Xiong, Jiaxing Ren, Elizabeth Michiko Ashley, Gordon S. W. Craig, Paul F. Nealey
Article
Multidisciplinary Sciences
Xiao Li, Jose A. Martinez-Gonzalez, Orlando Guzman, Xuedan Ma, Kangho Park, Chun Zhou, Yu Kambe, Hyeong Min Jin, James A. Dolan, Paul F. Nealey, Juan J. de Pablo
Article
Multidisciplinary Sciences
Hyeong Min Jin, Xiao Li, James A. Dolan, R. Joseph Kline, Jose A. Martinez-Gonzalez, Jiaxing Ren, Chun Zhou, Juan J. de Pablo, Paul F. Nealey
Article
Multidisciplinary Sciences
Jiaxing Ren, Tamar Segal-Peretz, Chun Zhou, Gordon S. W. Craig, Paul F. Nealey
Article
Multidisciplinary Sciences
Naoki Tambo, Yuxuan Liao, Chun Zhou, Elizabeth Michiko Ashley, Kouhei Takahashi, Paul F. Nealey, Yasuyuki Naito, Junichiro Shiomi
Article
Chemistry, Physical
Hongbo Feng, Moshe Dolejsi, Ning Zhu, Soonmin Yim, Whitney Loo, Peiyuan Ma, Chun Zhou, Gordon S. W. Craig, Wen Chen, Lei Wan, Ricardo Ruiz, Juan J. de Pablo, Stuart J. Rowan, Paul F. Nealey
Summary: This paper presents a high-throughput synthesis and characterization platform for the discovery and optimization of block copolymers (BCPs) for lithographic patterning. By synthesizing a library of BCPs covering a large parameter space, researchers are able to identify BCP chemistries that satisfy the design rules.
Article
Engineering, Electrical & Electronic
Moshe Dolejsi, Priya Moni, Cody T. Bezik, Chun Zhou, Juan J. de Pablo, Karen K. Gleason, Paul F. Nealey
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
(2019)
Proceedings Paper
Optics
Chun Zhou, Tsuyoshi Kurosawa, Takahiro Dazai, Jan Doise, Jiaxing Ren, Cody Bezik, Tamar Segal-Peretz, Akiyoshi Yamazaki, Roel Gronheid, Paulina Rincon-Delgadillo, Juan de Pablo, Paul F. Nealey
NOVEL PATTERNING TECHNOLOGIES 2018
(2018)
Proceedings Paper
Materials Science, Multidisciplinary
Jiajing Li, Chun Zhou, Xuanxuan Chen, Paulina Rincon-Delgadillo, Paul Nealey
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXV
(2018)
Article
Chemistry, Multidisciplinary
Chun Zhou, Tamar Segal-Peretz, Muhammed Enes Oruc, Hyo Seon Suh, Guangpeng Wu, Paul F. Nealey
ADVANCED FUNCTIONAL MATERIALS
(2017)