4.4 Article

Influence of substrate on structural, morphological and optical properties of TiO2 thin films deposited by reaction magnetron sputtering

Journal

AIP ADVANCES
Volume 7, Issue 12, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.5017242

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-

Funding

  1. Natural Science Foundation of China (NSFC) [11675029]
  2. Sichuan Province Science and Technology Program [2015GZ0194, 2016FZ0018]

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Titanium dioxide (TiO2) films have been prepared by DC reaction magnetron sputtering technique on different substrates (glass, SiO2, platinum electrode-Pt, Silicon-Si). X-ray diffraction (XRD) patterns showed that all TiO2 films were grown along the preferred orientation of (110) plane. Samples on Si and Pt substrates are almost monophasic rutile, however, samples on glass and SiO2 substrates accompanied by a weak anatase structure. Atomic force microscopy (AFM) images revealed uniform grain distribution except for films on Pt substrates. Photoluminescence (PL) spectra showed obvious intrinsic emission band, but films on glass was accompanied by a distinct defect luminescence region. Raman spectroscopy suggested that all samples moved to high wavenumbers and films on glass moved obviously. (c) 2017 Author(s).

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