Journal
THIN SOLID FILMS
Volume 627, Issue -, Pages 9-16Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2017.02.056
Keywords
Titanium dioxide; Thin films; Nitrogen addition; Magnetron sputtering; Structure
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Funding
- Federal Ministry of Economics and Technology
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N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N-2/O-2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data show the anatase-rutile phase transition and crystallites size reduction in N-TiO2 thin films with increase of nitrogen content in the reactive atmosphere. The investigation has been focused on phase transition, zeta potential, chemical bonds and UV-light influence on the wettability of the films versus nitrogen concentration. Hydrophilization of N-TiO2 films surface under UV-light has an irreversible character. (C) 2017 Elsevier B.V. All rights reserved.
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