Titanium dioxide thin films by atomic layer deposition: a review

Published 2017 View Full Article

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Title
Titanium dioxide thin films by atomic layer deposition: a review
Authors
Keywords
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Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 32, Issue 9, Pages 093005
Publisher
IOP Publishing
Online
2017-06-12
DOI
10.1088/1361-6641/aa78ce

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