Passivation of Ge/high-κ interface using RF Plasma nitridation

Published 2017 View Full Article

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Title
Passivation of Ge/high-κ interface using RF Plasma nitridation
Authors
Keywords
-
Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 33, Issue 1, Pages 015003
Publisher
IOP Publishing
Online
2017-11-08
DOI
10.1088/1361-6641/aa98cd

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