Journal
POLYMER
Volume 110, Issue -, Pages 131-138Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.polymer.2016.12.034
Keywords
Graphene; Nanoribbon; Block copolymer
Categories
Funding
- NSF CAREER [1150034]
- NSF-NASCENT Engineering Research Center [EEC-1160494]
- Welch Foundation [F-1709]
- DuPont Young Professor Award
- Takenaka Scholarship
- 3 M Nontenured Faculty Award
- Graduate Dean's Prestigious Fellowship
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [1150034] Funding Source: National Science Foundation
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Patterning graphene into nanoribbons (graphene nanoribbons, GNR) allows for tunability in the emerging fields of plasmonic devices in the mid-infrared and terahertz regime. However, the fabrication processes of GNR arrays for plasmonic devices often include a low-throughput electron beam lithography step that cannot be easily scaled to large areas. In this study, we developed a GNR fabrication method using block copolymer (BCP) lithography that takes advantage of the wetting transparency of graphene. One major advantage of this method is that the self-assembled domains of the polystyrene-block-poly(methyl methacrylate) BCP are oriented perpendicularly directly on top of the graphene where they can later serve as an etch mask. Large area (cm(2) scale, 3 mu m x 3 gm defect-free area) 13-51 nm wide GNR arrays were successfully fabricated using this scalable protocol. This wetting transparency-assisted GNR fabrication method could be useful for high-throughput production of various plasmonic devices, including biosensors, and photodetectors. (C) 2016 Elsevier Ltd. All rights reserved.
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