Towards fabrication of 3D isotopically modulated vertical silicon nanowires in selective areas by nanosphere lithography

Published 2017 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Towards fabrication of 3D isotopically modulated vertical silicon nanowires in selective areas by nanosphere lithography
Authors
Keywords
Self-assembly, Colloidal lithography, Dry etching, Nanofabrication, Vertically arranged silicon nanowire
Journal
MICROELECTRONIC ENGINEERING
Volume 179, Issue -, Pages 74-82
Publisher
Elsevier BV
Online
2017-04-26
DOI
10.1016/j.mee.2017.04.030

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.