Journal
MICROELECTRONIC ENGINEERING
Volume 176, Issue -, Pages 106-110Publisher
ELSEVIER
DOI: 10.1016/j.mee.2017.02.023
Keywords
Perovskite; Photovoltaic; Nanostructures; Ultrafast NIL; Interference lithography
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We report the nanopatterning of the methylammonium lead iodide (MAPbI(3)) perovsldte, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100 nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films. (C) 2017 Elsevier B.V. All rights reserved.
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