Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 164, Issue 7, Pages C367-C375Publisher
ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.1211707jes
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Funding
- U. S. Department of Energy, Energy Efficiency & Renewable Energy Vehicle Technologies Office
- Scientific User Facilities Division, Office of Basic Energy Sciences, U. S. Department of Energy
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A sequential isotopic tracer study of corrosion film growth for Mg-3Al-1Zn-0.25Mn (AZ31B) and Mg-1.2Zn-0.25Zr-< 0.5Nd (ZE10A) was conducted by 4 h immersion in (H2O)-O-18 or (D2O)-O-16, followed by a 20 h immersion in a 0.01 wt% NaCl (H2O)-O-18 or (D2O)-O-16 solution. Sputter depth profiles were obtained for O-16, O-18, H, and D using secondary ion mass spectrometry (SIMS). Compared to the previous tracer study for these alloys in salt-free water, the addition of 0.01 wt% NaCl resulted in a transition from oxygen inward-dominated film growth to a component of mixed inward/outward film growth for both alloys. The hydrogen tracer behavior remained inward growing for AZ31B, and short-circuit, inward growing for ZE10A, in both pure water and in 0.01 wt% NaCl solution, with extensive penetration of D beyond the film and into the underlying alloy also observed for ZE10A. Analysis of the films by X-ray photoelectron spectroscopy (XPS) and cross-section scanning transmission electron microscopy (STEM) indicated intermixed Mg(OH)(2) and MgO, with the relative fraction of Mg(OH)(2) peaking near the center of the film. These findings suggest a decoupled film growth mechanism, with initial formation of oxide followed by NaCl-accelerated conversion to hydroxide, likely by both solid-state and dissolution-precipitation processes. (C) The Author(s) 2017. Published by ECS. All rights reserved.
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