Iron Intercalation in Covalent–Organic Frameworks: A Promising Approach for Semiconductors

Title
Iron Intercalation in Covalent–Organic Frameworks: A Promising Approach for Semiconductors
Authors
Keywords
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Journal
Journal of Physical Chemistry C
Volume 121, Issue 39, Pages 21160-21170
Publisher
American Chemical Society (ACS)
Online
2017-09-07
DOI
10.1021/acs.jpcc.7b06617

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