In situ photoelectron spectroscopic characterization of c-BN films deposited via plasma enhanced chemical vapor deposition employing fluorine chemistry
In situ photoelectron spectroscopic characterization of c-BN films deposited via plasma enhanced chemical vapor deposition employing fluorine chemistry
Authors
Keywords
Cubic boron nitride (c-BN), Plasma CVD, Bias growth, Electron affinity, Work function, Surface electronic properties
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