Control of nanoparticle size and amount by using the mesh grid and applying DC-bias to the substrate in silane ICP-CVD process

Authors

Keywords

Si nanocrystal, Charged nanoparticles, Substrate bias, ICP-CVD, Nanoparticles in plasma

Journal

Volume 19, Issue 11, Pages -

Publisher

Springer Nature

Online

2017-11-09

DOI

10.1007/s11051-017-4068-3

References

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