Journal
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
Volume 33, Issue 3, Pages 291-294Publisher
JOURNAL MATER SCI TECHNOL
DOI: 10.1016/j.jmst.2016.04.010
Keywords
Atomic force microscopy; Coercivity; Magnetic properties; Magnetron sputtering; Thin film
Funding
- National Natural Science Foundation of China [51590883, 51471167, 51271179, 51571194]
- Chinese Academy of Sciences [KJZD-EW-M05-3]
- Ministry of Science, ICT and Future Planning/Korea Research Council for Industrial Science and Technology
Ask authors/readers for more resources
MnGa films were grown by magnetron sputtering on thermally oxidized Si (Si/SiO2) and glass substrates. Films grown on single-crystal Si (100) substrate with different underlayers were prepared for comparison. It is found that the Si/SiO2 substrate is more suitable for growing high-coercivity MnGa films than the glass substrate, which is the result of the isolated-island-like growth. A coercivity of 9.7 kOe can be achieved for the 10 nm MnGa films grown on Si/SiO2 substrate at substrate temperature TS of 450 degrees C. Optimized experimental conditions are specified by changing the thickness of the MnGa films and the temperature of the substrates. Copyright (C) 2017, The editorial office of Journal of Materials Science & Technology. Published by Elsevier Limited.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available