UV–vis spectroscopy study of plasma-activated water: Dependence of the chemical composition on plasma exposure time and treatment distance

Title
UV–vis spectroscopy study of plasma-activated water: Dependence of the chemical composition on plasma exposure time and treatment distance
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 57, Issue 1, Pages 0102B9
Publisher
Japan Society of Applied Physics
Online
2017-11-13
DOI
10.7567/jjap.57.0102b9

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