Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl2plasma etching of GaN

Title
Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl2plasma etching of GaN
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 56, Issue 2, Pages 026502
Publisher
Japan Society of Applied Physics
Online
2017-01-24
DOI
10.7567/jjap.56.026502

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