Structure and mechanical properties of reactive sputtered WCN films

Mechanical, tribological and corrosion performance of WBN composite films deposited by reactive magnetron sputtering

(2014) Lihua Yu et al.   APPLIED SURFACE SCIENCE

Structural and chemical composition analysis of WCN produced by pulsed vacuum arc discharge

(2013) R. Ospina et al.   SURFACE & COATINGS TECHNOLOGY

Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions

(2011) M.T. Hosseinnejad et al.   APPLIED SURFACE SCIENCE

Effect of substrate bias and temperature on magnetron sputtered CrSiN films

(2010) Shuyong Tan et al.   APPLIED SURFACE SCIENCE

Effect of copper content and substrate bias on structure and mechanical properties of reactive sputtered CrCuN films

(2010) Shuyong Tan et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Structural and morphological characterization WCxNy thin films grown by pulsed vacuum arc discharge in an argon–nitrogen atmosphere

(2010) R. Ospina-Ospina et al.   SURFACE & COATINGS TECHNOLOGY

Effects of bias voltage and annealing on the structure and mechanical properties of WC0.75N0.25 thin films

(2009) Y.D. Su et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Deposition of WNxCy thin films for diffusion barrier application using the dimethylhydrazido (2−) tungsten complex (CH3CN)Cl4W(NNMe2)

(2009) Hiral M. Ajmera et al.   THIN SOLID FILMS

Tungsten imido complexes as precursors to tungsten carbonitride thin films

(2008) Stephen E. Potts et al.   DALTON TRANSACTIONS

Deposition of WN[sub x]C[sub y] Using the Allylimido Complexes Cl[sub 4](RCN)W(NC[sub 3]H[sub 5]): Effect of NH[sub 3] on Film Properties

(2008) Hiral M. Ajmera et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY