Inductively-coupled plasma-enhanced chemical vapour deposition of hydrogenated amorphous silicon carbide thin films for MEMS

Published 2016 View Full Article

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Title
Inductively-coupled plasma-enhanced chemical vapour deposition of hydrogenated amorphous silicon carbide thin films for MEMS
Authors
Keywords
Silicon carbide, Inductively coupled, MEMS, Residual stress, Young’s modulus, Hardness, Fourier transform infrared spectroscopy
Journal
SENSORS AND ACTUATORS A-PHYSICAL
Volume 247, Issue -, Pages 647-655
Publisher
Elsevier BV
Online
2016-06-01
DOI
10.1016/j.sna.2016.05.042

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