Thick PECVD silicon dioxide films for MEMS devices

Published 2016 View Full Article

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Title
Thick PECVD silicon dioxide films for MEMS devices
Authors
Keywords
TEOS, Silicon dioxide, PECVD, ANOVA, Residual stress, MIM capacitor
Journal
SENSORS AND ACTUATORS A-PHYSICAL
Volume 240, Issue -, Pages 1-9
Publisher
Elsevier BV
Online
2016-01-12
DOI
10.1016/j.sna.2016.01.003

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