Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics
Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics
Authors
Keywords
Block copolymer, Directed self-assembly (DSA), Chemoepitaxy, Graphoepitaxy, Thin film
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