Journal
OPTICS LETTERS
Volume 41, Issue 8, Pages 1893-1896Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.41.001893
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- Department of Electronics and Information Technology, Ministry of Communications and Information Technology (DeitY)
- Defense Research and Development Organization, Government of India
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We present a large-area and single-step fabrication approach based on phase spatial light modulator (SLM)-assisted interference lithography for the realization of submicrometer photonic structures on photoresist. A multimirror beam steering unit is used to reflect the SLM-generated phase-engineered beams leading to a large angle between interfering beams while also preserving the large area of the interfering plane beams. Both translational and rotational periodic submicrometer structures are experimentally realized. This approach increases the flexibility of interference lithography to fabricate more complex submicrometer photonic structures and photonic metamaterial structures for future applications. (C) 2016 Optical Society of America
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