Journal
OPTICS AND LASER TECHNOLOGY
Volume 78, Issue -, Pages 34-41Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.optlastec.2015.09.016
Keywords
Light-emitting diodes; Arrays; Integrated optics devices; Microstructure fabrication; Substrate thickness
Categories
Funding
- National Natural Science Foundation of China (NSFC) [61274122]
- jinlin Province and Technology Development Plan [20100351, 20120323]
- Changchun Science and Technology Plan [2013269]
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An integrated high-resolution (individual pixel size 80 mu m x 80 mu m) solid-state self-emissive active matrix programmed with 320 x 240 micro-light-emitting-diode arrays structure was designed and fabricated on an AlGaInP semiconductor chip using micro electro-mechanical syStems, microstructure and semiconductor fabricating techniques. Row pixels share a p-electrode and line pixels share an n-electrode. We experimentally investigated GaAs substrate thickness affects the electrical and optical characteristics of the pixels. For a 150-mu m-thick GaAs substrate, the single pixel output power was 167.4 mu W at 5 mA, and increased to 326.411 mu W when current increase to 10 mA. The device investigated potentially plays an important role in many fields. (C) 2015 Elsevier Ltd. All rights reserved.
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