Thermodynamic study of the chemical vapor deposition in the SiCl3CH3–NH3–H2 system

Published 2015 View Full Article

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Title
Thermodynamic study of the chemical vapor deposition in the SiCl3CH3–NH3–H2 system
Authors
Keywords
-
Journal
CHEMICAL PHYSICS LETTERS
Volume 623, Issue -, Pages 29-36
Publisher
Elsevier BV
Online
2015-01-30
DOI
10.1016/j.cplett.2015.01.042

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