4.8 Article

Epitaxial Growth of MgxCa1-xO on GaN by Atomic Layer Deposition

Journal

NANO LETTERS
Volume 16, Issue 12, Pages 7650-7654

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.6b03638

Keywords

Epitaxy; dielectric; GaN; MOS-HEMT; magnesium calcium oxide

Funding

  1. Center for the Next Generation of Materials by Design, an Energy Frontier Research Center - U.S. DOE, Office of Science
  2. AFOSR [FA9550-12-1-0180]
  3. ONR [N000141512833]
  4. U.S. Department of Defense (DOD) [N000141512833] Funding Source: U.S. Department of Defense (DOD)

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We demonstrate for the first time that a single crystalline epitaxial MgxCa1-xO film can be deposited on gallium nitride (GaN) by atomic layer deposition (ALD). By adjusting the ratio between the amounts of Mg and Ca in the film, a lattice matched MgxCa1-xO/GaN(0001) interface can be achieved with low interfacial defect density. High-resolution X-ray diffraction (XRD) shows that the lattice parameter of this ternary oxide nearly obeys Vegard's law. An atomically sharp interface from cross-sectional transmission electron microscopy (TEM) confirmed the high quality of the epitaxy. High-temperature capacitance-voltage characterization showed that the film with composition Mg0.25Ca0.75O has the lowest interfacial defect density. With this optimal oxide composition, a Mg0.25Ca0.75O/AlGaN/GaN metal-oxide-semiconductor high-electron-mobility (MOS-HEMT) device was fabricated. An ultrahigh on/off ratio of 10(12) and a near ideal SS of 62 mV/dec were achieved with this device.

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