Amorphization of gold film on silicon single crystal by hardness indentation at room temperature

The formation of an amorphous gold-silicon alloy by indentation is reported. A polycrystalline gold film formed via vapour deposition on a silicon (111) substrate was indented using a Berkovich indenter with a load of 0.05 N. The indentation area was observed by transmission electron microscopy after thinning the silicon substrate from the back side (unindented surface). A set of halo rings, identified as an amorphous gold-silicon alloy was observed. A gold film on a SiO2 substrate was also used to investigate the effect of the substrate, and no amorphization was observed. The amorphization mechanism is discussed based on thermodynamics.

Automated summary

The formation of an amorphous gold-silicon alloy by indentation is reported. A polycrystalline gold film on a silicon substrate was indented and resulted in the formation of an amorphous alloy. The effect of the substrate was also investigated using a gold film on a SiO2 substrate, where no amorphization was observed. The amorphization mechanism is discussed based on thermodynamics.