Stamp degradation for high volume UV enhanced substrate conformal imprint lithography (UV-SCIL)

Title
Stamp degradation for high volume UV enhanced substrate conformal imprint lithography (UV-SCIL)
Authors
Keywords
Substrate conformal imprint lithography (SCIL), Nanoimprint lithography, PDMS, Soft stamp, Sol–Gel resist
Journal
MICROELECTRONIC ENGINEERING
Volume 153, Issue -, Pages 66-70
Publisher
Elsevier BV
Online
2016-01-21
DOI
10.1016/j.mee.2016.01.018

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