Journal
CHEMICAL COMMUNICATIONS
Volume 51, Issue 88, Pages 15967-15970Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c5cc06524k
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Funding
- Washington State University Research Advancement Challenge (RAC) grant
- NSF CMMI [1463616]
- Div Of Civil, Mechanical, & Manufact Inn
- Directorate For Engineering [1463616] Funding Source: National Science Foundation
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A low pressure vapour deposition (LPVD) technique is proposed as an environmentally friendly, cost-effective and versatile strategy for fabrication of sulfur nanomaterials. By controlling the characteristics of the deposit substrate for the LPVD, various sulfur-based nanomaterials have been obtained through a substrate-induced self-assembly process.
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